青年中文glow discharge的意思
glow discharge中文翻譯：
[電子]輝光放電
相似詞語短語
glow discharges───[電子]輝光放電
to discharge───放電；還債；辭退，解雇
air discharge───n.排氣；空氣放電；空氣排放量
to mischarge───弄錯
corona discharge───[物]電暈放電
brush discharge───[電]刷形放電
nasal discharge───鼻涕；流鼻涕
corona discharges───[物]電暈放電
general discharge───一般放電
雙語使用場景
The samples were deposited on c - Si substrates by glow discharge inH _ 2 and SiCl _ 4 mixture.───樣品是在H_ 2和SiCl_4混合氣體中用輝光放電方法淀積在晶體硅(c-Si)襯底上的.
simplest discharge to produce is the glow discharge.───最簡單的放電產生方法是輝光放電。
The research progress and generation mechanism of atmospheric pressure glow discharge plasma ( APGDP ) were reviewed.───綜述了常壓輝光放電等離子體 ( APGDP ) 的產生機理及研究進展.
MHCD can as plasma cathode for high - pressure glow discharge to solve the instability of glow - to - arc transition .───將 MHCD 作為大體積輝光放電的外部電子源,可以解決高氣壓下大體積輝光放電不穩定的問題.
The analyzed results indicate that it is abnormal glow discharge.───分析表明,放電處于異常輝光區.
Cathode temperature is one of the most important factors influencing the stability of high current glow discharge.───陰極的溫度是影響大電流輝光放電穩定工作的重要因素。
Microhollow cathode discharge ( MHCD ) is a novel, nonequilibrium , high - pressure, direct current glow discharge.───微空心陰極 放電 是一種新穎的 、 非平衡 、 高氣壓輝光放電.
Simultaneous multielement determination for superalloy by glow discharge optical emission spectrometry ( GDOES ) was investigated.───研究了用輝光光譜法 ( GDOES ) 同時測定高溫合金中的多種元素的含量.
The crystal growth by glow discharge sputterings and ion beam sputterings and thecrystal epitaxy are introduced.───介紹了氣相中晶體生長的方法,如輝光放電濺射法和離子束濺射沉積法以及晶體外延生長的方法.
Contact glow discharge electrolysis is a novel type of electrochemical process.───接觸輝光放電電解是一種新型的產生等離子體的電化學方法.
discharge characterized by a cathode fall that is small compared with that in a glow discharge.───與輝光放電相比，陰極位降相對較低的放電形式。
The simplest discharge to produce is the glow discharge.───最簡單的放電產生方法是輝光放電.
英語使用場景
An ozone generator with glow discharge tube has been developed by using glass as dielectric material.
Contact glow discharge electrolysis is a novel type of electrochemical process.
In AC electrical field, the stable homogeneous glow discharge will appear by using dielectric barrier layer and high-frequency power source.
Hot cathode glow discharge plasma chemical vapor deposition is a new method to deposit high-quality diamond films with high deposition rate.
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
Comparing with the conventional cold glow discharge, the hot cathode glow discharge is a new type of gas discharge.
Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently.
The crystal growth by glow discharge sputterings and ion beam sputterings and thecrystal epitaxy are introduced.
The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed.