chemical vapor deposition的意思

chemical vapor deposition中文翻譯：

化學氣相沉積；化學汽相淀積

相似詞語短語

vapor deposition───蒸鍍；汽相淀積；汽相淀積，蒸鍍

deposition───n.沉積物；礦床；革職；[律]（在法庭上的）宣誓作證，證詞

vapor───n.蒸氣；水蒸氣（等于vapour）

chemical───n.化學制品，化學藥品；adj.化學的

vapor max───蒸汽最大值

vapor rub───蒸汽摩擦

digesting deposition───消化沉積

vapor beast───蒸汽野獸

solace vapor───日光蒸汽

雙語使用場景

diamond thin films were grown by hot-filament chemical vapor deposition.───采用熱絲化學氣相沉積生長出優異的金剛石薄膜。

carbon nanotubes were synthesized by the heat filament chemical vapor deposition.───用的碳納米管是用熱燈絲化學氣相沉積法合成的。

carbon nanotubes were synthesized by the heat filament chemical vapor deposition (CVD).───碳納米管由化學氣相沉積法(CVD)合成。

Resin impregnation was used to density carbon fiber preforms after they had been densified by chemical vapor deposition (CVD).───將炭纖維坯體CVD增密至不同密度，再對其進行樹脂浸漬。

To produce flexible transistor arrays powerful enough to drive a display, engineers employ a process called chemical vapor deposition.───為了生產強大到可以驅動顯示的可彎曲晶體管序列，工程師們使用了一種稱為“化學氣相沉積”（chemicalvapordeposition）的流程。

The substrate is subjected to a chemical vapor deposition (370) of a carbon-containing gas to grow a non-woven fabric of carbon nanotubes.───使基片進行含碳氣體的化學氣相沉積，以生長碳納米管的非織造織物。

In their experiments, the scientists grew the diamond films using "pulsed liquid injection chemical vapor deposition techniques. "───在他們的試驗中，科學家用脈沖液體噴射的化學汽相沉積技術來增大鉆石薄膜的尺寸。

This paper gives an overview of plasma enhanced chemical vapor deposition (PECVD) used in the solar industry.───本文針對電漿輔助化學氣相沉積在太陽能產業上的應用作一概略性的介紹。

Catalytic chemical vapor deposition synthesis of helical carbon nanotubes and triple helices carbon nanostructure.───化學氣相沉積合成螺旋碳納米管和三重螺旋納米碳結構

英語使用場景

Hot cathode chemical vapor deposition method was established in order to deposit high - quality diamond films highrate.

Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate.

Composite film was prepared by on line chemical vapor deposition on float glass.

A double-deck plasma enhanced chemical vapor deposition (PECVD) facility was used to prepare silicon nitride film on the finely polished (100) plane ofp-type single crystal silicon wafer.

Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.

The defect properties in chemical vapor deposition diamond films doped by sulfur and boron were investigated by the Doppler broadening measurements and electron paramagnetic resonance (EPR).

MOCVD stands for Metalorganic Chemical Vapor Deposition, is one technology used to grow wafers from underlay with the MOCVD equipment.

Hot cathode glow discharge plasma chemical vapor deposition is a new method to deposit high-quality diamond films with high deposition rate.

Diamond film was coated by the hot filament chemical vapor deposition method.