青年中文青年中文

e-beam的意思

e-beam中文翻譯:

電子束

相似詞語短語

beam───n.橫梁;光線;電波;船寬;[計量]秤桿;vt.發送;以梁支撐;用…照射;流露;n.(Beam)人名;(阿拉伯)貝亞姆;(英)比姆;vi.照射;堆滿笑容

particle beam───粒子束,[高能]粒子束流

obliteration beam───閉塞光束

fleshing beam───刮皮板

balance beam───n.平衡木;天平橫梁;平衡桿,秤桿

cross-beam───橫梁;大梁

chamfering beam───倒棱梁

breast beam───撐梁;船首橫梁,[紡]胸梁;船首橫梁; 胸梁

tie-beam───連接梁

雙語使用場景

sodium titanate nanowire-based device is fabricated via e-beam lithography techniques.───利用電子束光刻技術制作了基于鈦酸鈉納米線的納米器件。

high speed Patten Generator is designed for nanometer E-beam lithography system.───為滿足納米級電子束曝光系統的要求,設計了高速圖形發生器。

proximity effect in the E-beam lithography system was verified by experiments.───電子束曝光機完成有關鄰近效應的實驗。

Several companies and research institutes are currently developing e-beam tools for direct write lithography and other niche applications.───盡管如此,目前仍有許多公司和研究機構在繼續研究和開發電子束光刻設備。

Thin Film thickness monitoring in thermal, e-beam, sputtering, magnetron, ion and laser deposition.───在熱,電子束,濺射,磁控,離子和激光沉積中,用做厚度監測

Using a magnetic field to curve the path of the e-beam permits screening of the hot filament.───用一個磁場使電子束走曲線路徑能夠屏蔽熱陰極。

Refers to an e-beam evaporator or exposure system.───指電子束蒸發器或曝光系統。

Using PMMA e-beam resist, a line resolution down t0 0. 1 ym has been achieved with this system.───使用PMMA電子束抗蝕劑,在該系統上獲得0.1微米的線分辨率。

Structural Design and Geometrical Accuracy Analysis of a New Precision Stage for E-Beam Lithography Machine───電子束曝光機的一種新型精密工件臺結構特點及幾何精度分析

英語使用場景

E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.

This paper describes the aberration and distortion of e-beam deflection magnetic field in which the parameters keep close to in the normal solution.

After electronic forming, we'll get one piece of holography nickel shim which records holography images and other information(for example, E-beam or Mole hidden text) in 2D/3D or Dot-master effect.

Based on the SDS-3 E-beam lithography machine, the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate.

A compact output switch for a water pulse forming line(PFL) e-beam accelerator was designed.