exposure dose的意思

exposure dose中文翻譯：

照射劑量

相似詞語短語

dose───vt.給藥；給…服藥；vi.服藥；n.(Dose)人名；(德)多澤；(意、西、葡、塞)多塞；(英)多斯；n.劑量；一劑，一服

exposure───n.暴露；曝光；揭露；陳列

daily dose───日劑量；一日量；日劑量; 一日量

exposure x───曝光x

doxological exposure───強迫癥暴露

double exposure───[攝]雙重曝光，兩次曝光

arsenate exposure───砷酸鹽暴露

extravascular dose───血管外劑量

dose escalation───劑量遞增

雙語使用場景

Exposure dose should be changed with the thickness of SU-8 photoresist.───SU - 8膠的厚度確定曝光劑量的大小。

exposure conditions including the exposure dose and source to film distance were changed to find the optimal one.───改變源片距離和曝光劑量，進一步突出所能發現的誤差，確定最佳曝光條件；

Methods the exposure dose, imaging time and image quality were compared in the two digital imaging system.───方法對兩種數字化成像系統的曝光劑量、成像時間和圖像質量進行比較分析。

Conclusions The navigatation time of submarine under sea is the main factor influencing the internal exposure dose of the submarines.───結論潛艇水下航行的時間是影響艇員內照射劑量的重要因素；

Methods The low luminous and high sensitive CCD camera was used in the X-ray auto exposure dose control.───方法：選擇低照度高靈敏度的CCD攝像機，配制X射線劑量自動控制器。

The cloudiness rate of vitreous body and eye lens were increased with exposure dose.───玻璃體、晶狀體混濁率隨著工作接觸劑量的增加而增加。

Dose equivalent of exposure dose in mammary is the highest, those in thyroid is the secondary, and genitical gland area has the lowest dose.───各敏感器官以乳腺受照劑量當量最大，其次為甲狀腺，性腺區最少。

Study of Surveillance of Exposure Dose of Radiation Workers and Patients───介入放射工作人員及患者受照劑量監測研究

Investigation of Indoor Radioactive Contamination and Exposure Dose Estimate───居室中放射性污染調查與輻射劑量估算

英語使用場景

The results of numerical simulation show the lesion of photoaging skin can be selectively damaged if the wavelength, exposure duration and exposure dose of irradiated ligh are reasonably selected.

The cloudiness rate of vitreous body and eye lens were increased with exposure dose.

Objective To investigate the magnitude of dose equivalent of exposure dose in different organs of human being using high and low KV X-Ray photography in chest.

The incidence rate of neurasthenic syndrome was 61.13%. It had rising trend with accumulative exposure dose.

Finally, the results of selecting the optimum exposure dose for two kinds of electron positive resists and the photos of LSI masks fabricated by this method are given.

The exposure dose distribution and line width control for the laser direct writing system are analyzed. Some experiments are also carried out.