青年中文photolithography的意思
photolithography中文翻譯：
n.影印石版術；照相平印術
photolithograph───n.影印石版畫；照相平版印刷品；vt.影印石版
photolithographs───n.影印石版畫；照相平版印刷品；vt.影印石版
photolithographed───n.影印石版畫；照相平版印刷品；vt.影印石版
photolithographer───n.影印石版畫；照相平版印刷品(photolithograph的變形)
photolithographic───adj.光刻法的；照相平版印刷的
photolithographing───n.影印石版畫；照相平版印刷品；vt.影印石版
chromolithography───n.石版或鋅版套色印刷術；彩色石印術
autolithography───n.直接平版印刷法
photomicrography───n.顯微照相術；顯微攝影術
Spherical aberration can damage image quality in photolithography.───球面像差能破壞光刻的成像質量。
Why not use photolithography to make nano structures?───為什么不使用光蝕刻法制造奈米結構？
First, consider the advantages and disadvantages of photolithography.───首先，想想光蝕刻法的優點跟缺點。
One of the procedures used in making monolithic integrated circuits which overcomes this problem is photolithography based on photoresists.───規程的當中一個被使用在做整體集成電路克服這個問題是石版影印根據光致抗蝕劑。
that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring.───測試晶圓片-影印過程中用于顆粒計算、量溶解度和檢測金屬污染的晶圓片。
One embodiment of the present invention provides techniques and systems for determining modeling parameters for a photolithography process.───一種用于為光刻工藝確定參數的方法，所述方法包括：接收布局；
Transmission phase gratings with continuous relief structures are fabricated with one step direct laser writing grayscale photolithography.───利用一步激光直寫灰階光刻方法制作了具有連續浮雕結構的透射式相位光柵。
The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division.───無掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
Contact-mode photolithography was used for realizing the monolithic integration of 0.───采用光學接觸式光刻方式，實現了單片集成0。
In the microfabrication process,(sentencedict.com) photolithography photoetching method and ion-exchanging technology were introduced and investigated for the special glass substrate.
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The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division.
Defocusing effect on the patterns of microlens array imaging photolithography is analyzed, and tolerance of defocusing range of the system is given.
Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference photolithography is much simple than the traditional photolithography.
Atom photolithography is a new application of atom optics in microfabrication technical field.
How to use the measured effective diffusion length and scanner illumination condition to demonstrate photolithography line width uniformity is introduced.
The principle for eliminating the diffraction error of photolithography with lens array is demonstrated by optical transfer function method.