photoetching的意思
photoetching中文翻譯:
n.光刻,[電子]光刻法;照相腐蝕法;照相感光制凸版
photoelectron spectroscopy───[物][分化]光電子能譜法;電光子分光光譜
photoelectric effect───光效應,[物]光電效應
Photoetching polysilicon forms force sensitive resistance bar.───經光刻后便形成力敏電阻條。
Aligning method, aligning substrate, photoetching device and component manufacturing method.───對準方法,對準基底,光刻裝置和器件制造方法。
Photoetching device, mirror element, device producing method and beam transfering system.───光刻裝置,鏡元件,器件制造方法,及束傳送系統。
The material of oar shape chemistry that phosphor turns indium chip to call photoetching glue through a kind on product line has package.───磷化銦晶片在出產線上經過一種稱為光刻膠的漿狀化學物質進行包裹。
Photoetching polysilicon forms force sensitive resistance bar.───多晶硅經光刻后便形成力敏電阻條。
In addition, 64 serial number by factory photoetching , leave out costly user process designing, can prevent serial number to be distorted.───此外,64位序列號由工廠光刻,省去了低廉的用戶編程,并可預防序列號被竄改。
obtaining a graph of a source drain electrode of the device by evenly gluing and photoetching the insulated mediate layer material;───在絕緣介質層材料上勻膠后光刻得到器件源漏電極的圖形;
Studies on the Acid-Generation Properties of a New Phthalocyanine Derivative as Photoetching Recording Materials───一種新型酞菁類光蝕刻記錄材料的光生酸性質研究
using photoetching and stripping technologies to prepare the gate electrode of a device on the plastic substrate;───使用光刻和剝離工藝在塑料襯底上制備出器件的柵電極;
Aligning method, aligning substrate, photoetching device and component manufacturing method.
In addition, 64 serial number by factory photoetching , leave out costly user process designing, can prevent serial number to be distorted.
In the microfabrication process, photolithography photoetching method and ion-exchanging technology were introduced and investigated for the special glass substrate.
When the probe inducing photoetching film is used for probe inducing surface plasma resonance photoetching, the corrosion linewidth is greatly reduced.
Brazing quality and product reliability are both increased as using high frequency pulse microplasma arc heating process for assembly brazing of cathode and photoetching grid of electron tube.
Photoetching device, mirror element, device producing method and beam transfering system.
Photoetching polysilicon forms force sensitive resistance bar.
Sucker, photoetching projective apparatus, method for producing sucker and component producing method.
It can be used in microelectronic processing, photoetching and scan microscopic focusing or imaging system.
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