APCVD的意思
「APCVD」經常作為「Atmospheric Pressure Chemical Vapor Deposition」的縮寫來使用,中文意思:「大氣壓化學氣相沉積」。
APCVD(大氣壓化學氣相沉積)詳細解釋
- 英文縮寫詞:APCVD
- 英文單詞:Atmospheric Pressure Chemical Vapor Deposition
- 中文簡要解釋:大氣壓化學氣相沉積
- 分類:Academic & Science
- 領域:Chemistry
英文縮寫APCVD的擴展資料
- TiN films were deposited on glass substrates by atmospheric pressure chemical vapor deposition ( APCVD ) using titanium tetrachloride ( TiCl_4 ) and ammonia ( NH_3 ) as reactants, nitrogen ( N_2 ) as protective atmosphere and carrier gas in this paper.本論文利用化學氣相沉積法(APCVD),以TiCl4和NH3氣體作為反應物,以惰性氣體N2作為保護氣體和載氣,在玻璃基板上沉積TiN薄膜。
- The paper put forward an aim to deposit titanium films and TiO_2 / SnO_2 : F multiple films prepared by the method of dielectric barrier discharge atmospheric pressure chemical vapor deposition ( DBD-CVD ).提出以介質阻擋放電化學氣相沉積法(DBD-CVD)制備TiO2單層薄膜和TiO2/SnO2:F復合薄膜的實驗目標。
- Structure and Hydrophilicity of Titanium Dioxide Film Prepared by Atmospheric Pressure Chemical Vapor Deposition(APCVD)AP-CVD法制備的二氧化鈦薄膜結構及親水性研究
- Growth and Properties of TiN Films on Glass by Atmospheric Pressure Chemical Vapor Deposition(APCVD)TiN鍍膜玻璃的常壓化學氣相沉積法制備及其光電性能研究
- The atmospheric pressure chemical vapor deposition ( APCVD ) technique has a great application potential to be a method to prepared the economical tin oxide films for its simple equipment, inexpensive and suitable for mass production.常壓化學氣相沉積法以其設備簡單、成本低、易實現大面積鍍膜等優點成為一種很有應用潛力的制備SnO2薄膜的方法,在鍍膜玻璃的工業化生產中有廣闊的應用前景。